Atomic Layer Deposition (ALD)
Research Group in Charge:
Platform:
Thin-Film and Epitaxy Laboratory (DünE)
Location:
Physics Building, Heinrich-Buff-Ring 16, room 06 (basement)
Type, properties, other information:
Picosun R-200 Standard with attached glove box for working in an inert atmosphere. Planar, porous and powder samples can be coated with thin metal and metal oxide layers. Available are Al2O3, CeO2, HfO2, MgO, NiO, Pt, SiO2, TiO2 and ZnO. Other materials are possible after consultation.
Person in Charge:
Dr. Jörg Schörmann
Institute of Experimental Physics I
Physics Building, Heinrich-Buff-Ring 16, room 334
Phone +49-641-99-33122