February 2014The large picture shows the recipient of our newly obtained sputter deposition system. The generated plasma can be seen in the small picture. Since this sputter deposition system has a direct connection to a glove box, all samples can be handled in an argon environment without contact to atmosphere. This addition to the physical vapor deposition (PVD) methods enables the research group of Prof. Janek to deposit large, homogeneous thin films using 4 inch targets. (The deposition system was acquired through the financial support of the BASF SE, Ludwigshafen. Picture submitted by Jochen Reinacher.)https://www.uni-giessen.de/en/faculties/f08/departments/physchem/janek/gallerypotm/pom2014/february-2014/viewhttps://www.uni-giessen.de/@@site-logo/logo.png
Document Actions
February 2014
The large picture shows the recipient of our newly obtained sputter deposition system. The generated plasma can be seen in the small picture. Since this sputter deposition system has a direct connection to a glove box, all samples can be handled in an argon environment without contact to atmosphere. This addition to the physical vapor deposition (PVD) methods enables the research group of Prof. Janek to deposit large, homogeneous thin films using 4 inch targets. (The deposition system was acquired through the financial support of the BASF SE, Ludwigshafen. Picture submitted by Jochen Reinacher.)
